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Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Nakajima, K. (author) / Joumori, S. (author) / Suzuki, M. (author) / Kimura, K. (author) / Osipowicz, T. (author) / Tok, K. L. (author) / Zheng, J. Z. (author) / See, A. (author) / Zhang, B. C. (author)
APPLIED SURFACE SCIENCE ; 237 ; 416-420
2004-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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