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Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Characterization of HfO2/Si(001) interface with high-resolution Rutherford backscattering spectroscopy
Nakajima, K. (Autor:in) / Joumori, S. (Autor:in) / Suzuki, M. (Autor:in) / Kimura, K. (Autor:in) / Osipowicz, T. (Autor:in) / Tok, K. L. (Autor:in) / Zheng, J. Z. (Autor:in) / See, A. (Autor:in) / Zhang, B. C. (Autor:in)
APPLIED SURFACE SCIENCE ; 237 ; 416-420
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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