4H Silicon Carbide Etching Using Chlorine Trifluoride Gas

Habuka, H. / Katsumi, Y. / Miura, Y. et al. | British Library Online Contents | 2009

Effect of chlorine trifluoride and perchloryl fluoride on construction materials

Grigger, J.C. / Miller, H.C. | Engineering Index Backfile | 1964

Development of Silicon Carbide Dry Etcher Using Chlorine Trifluoride Gas

Yajima, D. / Habuka, H. / Kato, T. | British Library Online Contents | 2014

Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature

Kawasaki, Ryohei / Umetsu, Yasuhiro / Kurashima, Keisuke et al. | British Library Online Contents | 2018

Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature

Kawasaki, Ryohei / Umetsu, Yasuhiro / Kurashima, Keisuke et al. | British Library Online Contents | 2018