A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Development of Silicon Carbide Dry Etcher Using Chlorine Trifluoride Gas
Development of Silicon Carbide Dry Etcher Using Chlorine Trifluoride Gas
Development of Silicon Carbide Dry Etcher Using Chlorine Trifluoride Gas
Yajima, D. (author) / Habuka, H. (author) / Kato, T. (author) / Okumura, H. / Harima, H. / Kimoto, T. / Yoshimoto, M. / Watanabe, H. / Hatayama, T. / Matsuura, H.
2014-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
4H Silicon Carbide Etching Using Chlorine Trifluoride Gas
| British Library Online Contents | 2009
BORON CARBIDE SINTERED BODY AND ETCHER INCLUDING THE SAME
| European Patent Office | 2020
BORON CARBIDE SINTERED BODY AND ETCHER INCLUDING THE SAME
| European Patent Office | 2020
| DataCite | 1908
| DataCite | 1908