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Damage behavior of 200-nm thin copper films under cyclic loading
Damage behavior of 200-nm thin copper films under cyclic loading
Damage behavior of 200-nm thin copper films under cyclic loading
Zhang, G. P. (author) / Volkert, C. A. (author) / Schwaiger, R. (author) / Arzt, E. (author) / Kraft, O. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 201-207
2005-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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