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HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

Zhu, J. / Liu, Z. G. / Li, Y. R.

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HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

Zhu, J. / Liu, Z. G. / Li, Y. R.

HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

Zhu, J. / Liu, Z. G. / Li, Y. R.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

HfAlON films fabricated by pulsed laser ablation for high-k gate dielectric applications

Contributors:

Zhu, J. (author) / Liu, Z. G. (author) / Li, Y. R. (author)

Published in:

MATERIALS LETTERS ; 59 ; 821-825

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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