Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication: Fid-Bau Portal

Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Youn, S. W. / Kang, C. G.

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Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Youn, S. W. / Kang, C. G.

Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Youn, S. W. / Kang, C. G.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Etching Mask Effect of the Nanoscratched Borosilicate Surface and Its Application to Maskless Pattern Fabrication

Contributors:

Youn, S. W. (author) / Kang, C. G. (author)

Published in:

MATERIALS SCIENCE FORUM ; 475/479 ; 3479-3482

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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