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    A rasterization method for generating exposure pattern images with optical maskless lithography

    New search for: Lee, J.
    New search for: Lee, H.
    New search for: Yang, J.

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    A rasterization method for generating exposure pattern images with optical maskless lithography

    New search for: Lee, J.
    New search for: Lee, H.
    New search for: Yang, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A rasterization method for generating exposure pattern images with optical maskless lithography

    New search for: Lee, J.
    New search for: Lee, H.
    New search for: Yang, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    A rasterization method for generating exposure pattern images with optical maskless lithography

    Contributors:

    Lee, J. (author) / Lee, H. (author) / Yang, J. (author)

    Published in:

    JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY ; 32 ; 2209-2218

    Publication date:

    2018-01-01

    Size:

    10 pages

    ISSN:

    1738-494X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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