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    Study of the poly/epi kinetic ratio in SiH4 based chemistry for new CMOS architectures

    New search for: Talbot, A.
    New search for: Arcamone, J.
    New search for: Fellous, C.
    New search for: Deleglise, F.
    New search for: Dutartre, D.

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    Study of the poly/epi kinetic ratio in SiH4 based chemistry for new CMOS architectures

    New search for: Talbot, A.
    New search for: Arcamone, J.
    New search for: Fellous, C.
    New search for: Deleglise, F.
    New search for: Dutartre, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study of the poly/epi kinetic ratio in SiH4 based chemistry for new CMOS architectures

    New search for: Talbot, A.
    New search for: Arcamone, J.
    New search for: Fellous, C.
    New search for: Deleglise, F.
    New search for: Dutartre, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Study of the poly/epi kinetic ratio in SiH4 based chemistry for new CMOS architectures

    Contributors:

    Talbot, A. (author) / Arcamone, J. (author) / Fellous, C. (author) / Deleglise, F. (author) / Dutartre, D. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 21-24

    Publication date:

    2005-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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