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Characterization of Zr-Si-N films deposited by cathodic vacuum arc with different N2/SiH4 flow rates
Characterization of Zr-Si-N films deposited by cathodic vacuum arc with different N2/SiH4 flow rates
Characterization of Zr-Si-N films deposited by cathodic vacuum arc with different N2/SiH4 flow rates
Zhang, G. P. (author) / Niu, E. W. (author) / Wang, X. Q. (author) / Lv, G. H. (author) / Zhou, L. (author) / Pang, H. (author) / Huang, J. (author) / Chen, W. (author) / Yang, S. Z. (author)
APPLIED SURFACE SCIENCE ; 258 ; 3674-3678
2012-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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