Growth mode during initial stage of chemical vapor deposition: Fid-Bau Portal

Growth mode during initial stage of chemical vapor deposition

Kajikawa, Y. / Noda, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Growth mode during initial stage of chemical vapor deposition

Kajikawa, Y. / Noda, S.

Growth mode during initial stage of chemical vapor deposition

Kajikawa, Y. / Noda, S.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Growth mode during initial stage of chemical vapor deposition

Contributors:

Kajikawa, Y. (author) / Noda, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 245 ; 281-289

Publication date:

2005-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Fang, P. H. / Hou, L. | British Library Online Contents | 2000

Influence of surface additives iodine and indium on the initial growth in copper chemical vapor deposition

Chang, T. Y. / Tze, J. J. / Tsai, D. S. | British Library Online Contents | 2004

Metal-organic chemical vapor deposition growth of GaN

Lu, D.-C. / Wang, D. / Wang, X. et al. | British Library Online Contents | 1995

Point defect incorporation during diamond chemical vapor deposition

Battaile, C. C. / Srolovitz, D. J. / Butler, J. E. | British Library Online Contents | 1999

Growth of Bulk SiC by Halide Chemical Vapor Deposition

Fanton, M. / Skowronski, M. / Snyder, D. et al. | British Library Online Contents | 2004