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Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Nistor, L. C. (author) / Richard, O. (author) / Zhao, C. (author) / Bender, H. (author) / Van Tendeloo, G. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 1741-1750
2005-01-01
10 pages
Article (Journal)
English
DDC:
620.11
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