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Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: An in situ transmission electron microscopy study
Nistor, L. C. (Autor:in) / Richard, O. (Autor:in) / Zhao, C. (Autor:in) / Bender, H. (Autor:in) / Van Tendeloo, G. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 1741-1750
01.01.2005
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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