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    Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Sokol, V.
    New search for: Schreckenbach, J.

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    Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Sokol, V.
    New search for: Schreckenbach, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Sokol, V.
    New search for: Schreckenbach, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique

    Contributors:

    Vrublevsky, I. (author) / Parkoun, V. (author) / Sokol, V. (author) / Schreckenbach, J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 227-233

    Publication date:

    2005-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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