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    Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Schreckenbach, J.
    New search for: Goedel, W. A.

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    Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Schreckenbach, J.
    New search for: Goedel, W. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique

    New search for: Vrublevsky, I.
    New search for: Parkoun, V.
    New search for: Schreckenbach, J.
    New search for: Goedel, W. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Export, share and cite

    Document information
    Title:

    Dissolution behaviour of the barrier layer of porous oxide films on aluminum formed in phosphoric acid studied by a re-anodizing technique

    Contributors:

    Vrublevsky, I. (author) / Parkoun, V. (author) / Schreckenbach, J. (author) / Goedel, W. A. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 5100-5108

    Publication date:

    2006-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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