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Influence of titanium oxide films on copper nucleation during electrodeposition

Chang, H. K. / Choe, B. H. / Lee, J. K.

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Influence of titanium oxide films on copper nucleation during electrodeposition

Chang, H. K. / Choe, B. H. / Lee, J. K.

Influence of titanium oxide films on copper nucleation during electrodeposition

Chang, H. K. / Choe, B. H. / Lee, J. K.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Influence of titanium oxide films on copper nucleation during electrodeposition

Contributors:

Chang, H. K. (author) / Choe, B. H. (author) / Lee, J. K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING A ; 409 ; 317-328

Publication date:

2005-01-01

Size:

12 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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