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    Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition

    New search for: Fang, T. H.
    New search for: Chang, W. J.

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    Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition

    New search for: Fang, T. H.
    New search for: Chang, W. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition

    New search for: Fang, T. H.
    New search for: Chang, W. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Nanomechanical characteristics of SnO2:F thin films deposited by chemical vapor deposition

    Contributors:

    Fang, T. H. (author) / Chang, W. J. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 1863-1869

    Publication date:

    2005-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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