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    Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

    New search for: Wang, D.
    New search for: Wang, M.
    New search for: Xu, X. H.
    New search for: Hou, Y.
    New search for: Wang, H.
    New search for: Han, H.

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    Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

    New search for: Wang, D.
    New search for: Wang, M.
    New search for: Xu, X. H.
    New search for: Hou, Y.
    New search for: Wang, H.
    New search for: Han, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

    New search for: Wang, D.
    New search for: Wang, M.
    New search for: Xu, X. H.
    New search for: Hou, Y.
    New search for: Wang, H.
    New search for: Han, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

    Contributors:

    Wang, D. (author) / Wang, M. (author) / Xu, X. H. (author) / Hou, Y. (author) / Wang, H. (author) / Han, H. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 21 ; 635-637

    Publication date:

    2002-01-01

    Size:

    3 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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