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Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation
Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation
Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation
Li, W. L. (author) / Fei, W. D. (author) / Hanabusa, T. (author)
APPLIED SURFACE SCIENCE ; 252 ; 2847-2852
2006-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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