Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates: Fid-Bau Portal

Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates

Mitchell, D. R. G. / Triani, G. / Attard, D. J. / Finnie, K. S. / Evans, P. J. / Barbe, C. J. / Bartlett, J. R.

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Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates

Mitchell, D. R. G. / Triani, G. / Attard, D. J. / Finnie, K. S. / Evans, P. J. / Barbe, C. J. / Bartlett, J. R.

Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates

Mitchell, D. R. G. / Triani, G. / Attard, D. J. / Finnie, K. S. / Evans, P. J. / Barbe, C. J. / Bartlett, J. R.

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Check availability in my library

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Document information

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Document information

Title:

Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates

Contributors:

Mitchell, D. R. G. (author) / Triani, G. (author) / Attard, D. J. (author) / Finnie, K. S. (author) / Evans, P. J. (author) / Barbe, C. J. (author) / Bartlett, J. R. (author)

Published in:

SMART MATERIALS AND STRUCTURES ; 15 ; S57-S64

Publication date:

2006-01-01

Size:

S57-S64

ISSN:

0964-1726

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530

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