Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition: Fid-Bau Portal

Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition

Martínez-Castelo, J.R. / López, J. / Domínguez, D. / Murillo, E. / Machorro, R. / Borbón-Nuñez, H.A. / Fernandez-Alvarez, I. / Arias, A. / Curiel, M. / Nedev, N. / ... [more]

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Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition

Martínez-Castelo, J.R. / López, J. / Domínguez, D. / Murillo, E. / Machorro, R. / Borbón-Nuñez, H.A. / Fernandez-Alvarez, I. / Arias, A. / Curiel, M. / Nedev, N. / ... [more]

Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition

Martínez-Castelo, J.R. / López, J. / Domínguez, D. / Murillo, E. / Machorro, R. / Borbón-Nuñez, H.A. / Fernandez-Alvarez, I. / Arias, A. / Curiel, M. / Nedev, N. / ... [more]

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Check availability in my library

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Document information

Title:

Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition

Contributors:

Martínez-Castelo, J.R. (author) / López, J. (author) / Domínguez, D. (author) / Murillo, E. (author) / Machorro, R. (author) / Borbón-Nuñez, H.A. (author) / Fernandez-Alvarez, I. (author) / Arias, A. (author) / Curiel, M. (author) / Nedev, N. (author)

Published in:

Materials science in semiconductor processing ; 71 ; 290-295

Publication date:

2017-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

Martínez-Castelo, J.R. / López, J. / Domínguez, D. et al. | British Library Online Contents | 2017

Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition

Martínez-Castelo, J.R. / López, J. / Domínguez, D. et al. | British Library Online Contents | 2017

Atomic layer deposition of TiO~2 and Al~2O~3 thin films and nanolaminates

Mitchell, D. R. G. / Triani, G. / Attard, D. J. et al. | British Library Online Contents | 2006

Structural properties of Al2O3 dielectrics grown on TiN metal substrates by atomic layer deposition

Hsieh, C. I. / Pan, T. M. / Lin, J. C. et al. | British Library Online Contents | 2009

Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition

Nie, X. / Ma, D. / Ma, F. et al. | British Library Online Contents | 2017