Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering: Fid-Bau Portal

Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering

Jiang, N. / Shen, Y. G. / Zhang, H. J. / Bao, S. N. / Hou, X. Y.

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Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering

Jiang, N. / Shen, Y. G. / Zhang, H. J. / Bao, S. N. / Hou, X. Y.

Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering

Jiang, N. / Shen, Y. G. / Zhang, H. J. / Bao, S. N. / Hou, X. Y.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Superhard nanocomposite Ti-Al-Si-N films deposited by reactive unbalanced magnetron sputtering

Contributors:

Jiang, N. (author) / Shen, Y. G. (author) / Zhang, H. J. (author) / Bao, S. N. (author) / Hou, X. Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 135 ; 1-9

Publication date:

2006-01-01

Size:

9 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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