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    Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

    New search for: Jiang, N.
    New search for: Shen, Y. G.
    New search for: Mai, Y. W.
    New search for: Chan, T.
    New search for: Tung, S. C.

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    Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

    New search for: Jiang, N.
    New search for: Shen, Y. G.
    New search for: Mai, Y. W.
    New search for: Chan, T.
    New search for: Tung, S. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

    New search for: Jiang, N.
    New search for: Shen, Y. G.
    New search for: Mai, Y. W.
    New search for: Chan, T.
    New search for: Tung, S. C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

    Contributors:

    Jiang, N. (author) / Shen, Y. G. (author) / Mai, Y. W. (author) / Chan, T. (author) / Tung, S. C. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 106 ; 163-171

    Publication date:

    2004-01-01

    Size:

    9 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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