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    Gas tunnel type plasma spraying deposition and microstructure characterization of silicon carbide films for thermoelectric applications

    New search for: Fahim, N. F.
    New search for: Kobayashi, A.

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    Gas tunnel type plasma spraying deposition and microstructure characterization of silicon carbide films for thermoelectric applications

    New search for: Fahim, N. F.
    New search for: Kobayashi, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Gas tunnel type plasma spraying deposition and microstructure characterization of silicon carbide films for thermoelectric applications

    New search for: Fahim, N. F.
    New search for: Kobayashi, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Gas tunnel type plasma spraying deposition and microstructure characterization of silicon carbide films for thermoelectric applications

    Contributors:

    Fahim, N. F. (author) / Kobayashi, A. (author)

    Published in:

    MATERIALS LETTERS ; 60 ; 3838-3841

    Publication date:

    2006-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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