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A platform for research: civil engineering, architecture and urbanism
METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS FOR SEMICONDUCTOR CHAMBER APPLICATIONS
Methods and apparatus for producing bulk silicon carbide and producing silicon carbide coatings are provided herein. The method includes feeding a mixture of silicon carbide and ceramic into a plasma sprayer. The plasma generates a stream towards a substrate forming a bulk material or optionally a coating on the substrate such as an article upon contact therewith. In embodiments, the substrate can be removed, leaving a component part fabricated from bulk silicon carbide.
METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS FOR SEMICONDUCTOR CHAMBER APPLICATIONS
Methods and apparatus for producing bulk silicon carbide and producing silicon carbide coatings are provided herein. The method includes feeding a mixture of silicon carbide and ceramic into a plasma sprayer. The plasma generates a stream towards a substrate forming a bulk material or optionally a coating on the substrate such as an article upon contact therewith. In embodiments, the substrate can be removed, leaving a component part fabricated from bulk silicon carbide.
METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS FOR SEMICONDUCTOR CHAMBER APPLICATIONS
CHEN YIKAI (author) / PAL ANIRUDDHA (author) / CHAUDHARI SAURABH M (author) / YANG YAO-HUNG (author) / SALIMIAN SIAMAK (author) / CHO TOM K (author)
2023-02-16
Patent
Electronic Resource
English
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