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Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Guo, Y. / Zhang, X. w. / Han, G. r.

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Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Guo, Y. / Zhang, X. w. / Han, G. r.

Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Guo, Y. / Zhang, X. w. / Han, G. r.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Contributors:

Guo, Y. (author) / Zhang, X. w. (author) / Han, G. r. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 135 ; 83-87

Publication date:

2006-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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