Use of successive ionic layer adsorption and reaction (SILAR) method for amorphous titanium dioxide thin films growth: Fid-Bau Portal

Use of successive ionic layer adsorption and reaction (SILAR) method for amorphous titanium dioxide thin films growth

Kale, S. S. / Mane, R. S. / Chung, H. / Yoon, M. Y. / Lokhande, C. D. / Han, S. H.

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Use of successive ionic layer adsorption and reaction (SILAR) method for amorphous titanium dioxide thin films growth

Kale, S. S. / Mane, R. S. / Chung, H. / Yoon, M. Y. / Lokhande, C. D. / Han, S. H.

Use of successive ionic layer adsorption and reaction (SILAR) method for amorphous titanium dioxide thin films growth

Kale, S. S. / Mane, R. S. / Chung, H. / Yoon, M. Y. / Lokhande, C. D. / Han, S. H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Use of successive ionic layer adsorption and reaction (SILAR) method for amorphous titanium dioxide thin films growth

Contributors:

Kale, S. S. (author) / Mane, R. S. (author) / Chung, H. (author) / Yoon, M. Y. (author) / Lokhande, C. D. (author) / Han, S. H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 421-424

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Pathan, H. M. / Lokhande, C. D. / Kulkarni, S. S. et al. | British Library Online Contents | 2005