A platform for research: civil engineering, architecture and urbanism
Impurity Concentration Dependence of Recrystallization Process of Phosphorus Implanted 4H-SiC(11-20)
Impurity Concentration Dependence of Recrystallization Process of Phosphorus Implanted 4H-SiC(11-20)
Impurity Concentration Dependence of Recrystallization Process of Phosphorus Implanted 4H-SiC(11-20)
Satoh, M. (author) / Suzuki, T. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
2006-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Measurement of Impurity Concentration at Grain Boundaries after Recrystallization
British Library Online Contents | 2004
|Recrystallization of Na-implanted silicon
British Library Online Contents | 1997
|Dependence of contact resistivity on impurity concentration in Co/Si systems
British Library Online Contents | 2000
|Recrystallization of Si-, As-, and BF~2-Implanted, Bonded SOI
British Library Conference Proceedings | 1998
|Orientation Dependence of Recrystallization in Aluminum
British Library Online Contents | 2002
|