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    Characterization of Low Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

    New search for: Dunning, J.
    New search for: Fu, X. A.
    New search for: Mehregany, M.
    New search for: Zorman, C. A.
    New search for: Devaty, R. P.
    New search for: Larkin, D. J.
    New search for: Saddow, S. E.

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    Characterization of Low Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

    New search for: Dunning, J.
    New search for: Fu, X. A.
    New search for: Mehregany, M.
    New search for: Zorman, C. A.
    New search for: Devaty, R. P.
    New search for: Larkin, D. J.
    New search for: Saddow, S. E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of Low Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

    New search for: Dunning, J.
    New search for: Fu, X. A.
    New search for: Mehregany, M.
    New search for: Zorman, C. A.
    New search for: Devaty, R. P.
    New search for: Larkin, D. J.
    New search for: Saddow, S. E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characterization of Low Stress, Undoped LPCVD Polycrystalline SiC Films for MEMS Applications

    Contributors:

    Dunning, J. (author) / Fu, X. A. (author) / Mehregany, M. (author) / Zorman, C. A. (author) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.

    Published in:

    Silicon Carbide and Related Materials - 2005 ; 1103-1106

    MATERIALS SCIENCE FORUM ; 527/529

    Publication date:

    2006-01-01

    Size:

    4 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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