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    Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

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    New search for: Li, D.

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    Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

    New search for: Liu, X.
    New search for: Li, D.

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    Access via TIB
    Check availability in my library
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    Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

    New search for: Liu, X.
    New search for: Li, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Title:

    Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

    Contributors:

    Liu, X. (author) / Li, D. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 2143-2147

    Publication date:

    2006-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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