Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering: Fid-Bau Portal

Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering

Feng, L. p. / Li, N. / Tian, H. / Liu, Z. t.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering

Feng, L. p. / Li, N. / Tian, H. / Liu, Z. t.

Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering

Feng, L. p. / Li, N. / Tian, H. / Liu, Z. t.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering

Contributors:

Feng, L. p. (author) / Li, N. (author) / Tian, H. (author) / Liu, Z. t. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 49 ; 1875-1881

Publication date:

2014-01-01

Size:

7 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993

LaB~x thin films prepared by magnetron sputtering

Kinbara, A. / Nakano, T. / Kobayashi, A. et al. | British Library Online Contents | 1993

Influence of charged particle bombardment and sputtering parameters on the properties of HfO2 films prepared by dc reactive magnetron sputtering

Liu, X. / Li, D. | British Library Online Contents | 2006

Properties of TiO~2 Thin Films Prepared by Magnetron Sputtering

Zhang, W. / Li, Y. / Wang, F. | British Library Online Contents | 2002

Properties of zirconia thin films prepared by reactive magnetron sputtering

Hembram, K. P. / Mohan Rao, G. | British Library Online Contents | 2007