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    Investigation of Thermo-Chemical Polishing of CVD Diamond Film

    New search for: Chou, W. C.
    New search for: Chao, C. L.
    New search for: Chien, H.
    New search for: Ma, K. J.
    New search for: Lin, H. Y.
    New search for: Guo, D.
    New search for: Kuriyagawa, T.
    New search for: Wang, J.
    New search for: Tamaki, J.

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    Investigation of Thermo-Chemical Polishing of CVD Diamond Film

    New search for: Chou, W. C.
    New search for: Chao, C. L.
    New search for: Chien, H.
    New search for: Ma, K. J.
    New search for: Lin, H. Y.
    New search for: Guo, D.
    New search for: Kuriyagawa, T.
    New search for: Wang, J.
    New search for: Tamaki, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of Thermo-Chemical Polishing of CVD Diamond Film

    New search for: Chou, W. C.
    New search for: Chao, C. L.
    New search for: Chien, H.
    New search for: Ma, K. J.
    New search for: Lin, H. Y.
    New search for: Guo, D.
    New search for: Kuriyagawa, T.
    New search for: Wang, J.
    New search for: Tamaki, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Investigation of Thermo-Chemical Polishing of CVD Diamond Film

    Contributors:

    Chou, W. C. (author) / Chao, C. L. (author) / Chien, H. (author) / Ma, K. J. (author) / Lin, H. Y. (author) / Guo, D. / Kuriyagawa, T. / Wang, J. / Tamaki, J.

    Published in:

    Advances in Abrasive Technology IX ; 195-200

    KEY ENGINEERING MATERIALS ; 329

    Publication date:

    2007-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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