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    Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

    New search for: Sohal, R.
    New search for: Torche, M.
    New search for: Henkel, K.
    New search for: Hoffmann, P.
    New search for: Tallarida, M.
    New search for: Schmeier, D.

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    Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

    New search for: Sohal, R.
    New search for: Torche, M.
    New search for: Henkel, K.
    New search for: Hoffmann, P.
    New search for: Tallarida, M.
    New search for: Schmeier, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

    New search for: Sohal, R.
    New search for: Torche, M.
    New search for: Henkel, K.
    New search for: Hoffmann, P.
    New search for: Tallarida, M.
    New search for: Schmeier, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Al-oxynitrides as a buffer layer for Pr2O3/SiC interfaces

    Contributors:

    Sohal, R. (author) / Torche, M. (author) / Henkel, K. (author) / Hoffmann, P. (author) / Tallarida, M. (author) / Schmeier, D. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 945-948

    Publication date:

    2006-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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