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    Etching characteristics of high-purity aluminum in hydrochloric acid solutions

    New search for: Oh, H. J.
    New search for: Lee, J. H.
    New search for: Ahn, H. J.
    New search for: Jeong, Y.
    New search for: Park, N. J.
    New search for: Kim, S. S.
    New search for: Chi, C. S.

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    Etching characteristics of high-purity aluminum in hydrochloric acid solutions

    New search for: Oh, H. J.
    New search for: Lee, J. H.
    New search for: Ahn, H. J.
    New search for: Jeong, Y.
    New search for: Park, N. J.
    New search for: Kim, S. S.
    New search for: Chi, C. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Etching characteristics of high-purity aluminum in hydrochloric acid solutions

    New search for: Oh, H. J.
    New search for: Lee, J. H.
    New search for: Ahn, H. J.
    New search for: Jeong, Y.
    New search for: Park, N. J.
    New search for: Kim, S. S.
    New search for: Chi, C. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Etching characteristics of high-purity aluminum in hydrochloric acid solutions

    Contributors:

    Oh, H. J. (author) / Lee, J. H. (author) / Ahn, H. J. (author) / Jeong, Y. (author) / Park, N. J. (author) / Kim, S. S. (author) / Chi, C. S. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING A ; 449/451 ; 348-351

    Publication date:

    2007-01-01

    Size:

    4 pages

    ISSN:

    0921-5093

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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