Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering: Fid-Bau Portal

Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Cui, Y. / Du, H. / Lee, S. W. / Sun, C. / Wen, L. S.

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Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Cui, Y. / Du, H. / Lee, S. W. / Sun, C. / Wen, L. S.

Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Cui, Y. / Du, H. / Lee, S. W. / Sun, C. / Wen, L. S.

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Check availability in my library

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Document information

Title:

Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering

Contributors:

Cui, Y. (author) / Du, H. (author) / Lee, S. W. (author) / Sun, C. (author) / Wen, L. S. (author) / Kim, H. / Hojo, J. / Lee, S. W.

Published in:

Eco-Materials Processing and Design VIII ; 27-30

MATERIALS SCIENCE FORUM ; 544/545

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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