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Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering
Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering
Characterization and Wettability of TiO~2 Films Deposited by Mid-Frequency Magnetron Reactive Sputtering
Cui, Y. (Autor:in) / Du, H. (Autor:in) / Lee, S. W. (Autor:in) / Sun, C. (Autor:in) / Wen, L. S. (Autor:in) / Kim, H. / Hojo, J. / Lee, S. W.
01.01.2007
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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