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    Direct chemical vapor deposition growth of tunable HfSiON films by a new precursor combination

    New search for: Xia, B.
    New search for: Fisher, M. L.
    New search for: Stemper, H.
    New search for: Misra, A.

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    Direct chemical vapor deposition growth of tunable HfSiON films by a new precursor combination

    New search for: Xia, B.
    New search for: Fisher, M. L.
    New search for: Stemper, H.
    New search for: Misra, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Direct chemical vapor deposition growth of tunable HfSiON films by a new precursor combination

    New search for: Xia, B.
    New search for: Fisher, M. L.
    New search for: Stemper, H.
    New search for: Misra, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Direct chemical vapor deposition growth of tunable HfSiON films by a new precursor combination

    Contributors:

    Xia, B. (author) / Fisher, M. L. (author) / Stemper, H. (author) / Misra, A. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 22 ; 1024-1028

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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