Raman spectroscopy of a-C:H:N films deposited using ECR-CVD with mixed gas: Fid-Bau Portal

Raman spectroscopy of a-C:H:N films deposited using ECR-CVD with mixed gas

Liu, F. X. / Yao, K. L. / Liu, Z. L.

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Raman spectroscopy of a-C:H:N films deposited using ECR-CVD with mixed gas

Liu, F. X. / Yao, K. L. / Liu, Z. L.

Raman spectroscopy of a-C:H:N films deposited using ECR-CVD with mixed gas

Liu, F. X. / Yao, K. L. / Liu, Z. L.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Raman spectroscopy of a-C:H:N films deposited using ECR-CVD with mixed gas

Contributors:

Liu, F. X. (author) / Yao, K. L. (author) / Liu, Z. L. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 6957-6962

Publication date:

2007-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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