Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films: Fid-Bau Portal

Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Tkachev, S. N. / Manghnani, M. H. / Niilisk, A. / Aarik, J. / Mändar, H.

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Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Tkachev, S. N. / Manghnani, M. H. / Niilisk, A. / Aarik, J. / Mändar, H.

Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Tkachev, S. N. / Manghnani, M. H. / Niilisk, A. / Aarik, J. / Mändar, H.

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Check availability in my library

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Document information

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Document information

Title:

Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO2 and HfO2 thin films

Contributors:

Tkachev, S. N. (author) / Manghnani, M. H. (author) / Niilisk, A. (author) / Aarik, J. (author) / Mändar, H. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 40 ; 4293-4298

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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