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Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures
Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures
Polystyrene-Polymethylmethacrylate Block Copolymers for Lithographically Assisted Bottom-Up Assembly of Nanostructures
Borsetto, F. (author) / Kosmala, B. (author) / Fitzgerald, T. G. (author) / Shaw, M. T. (author) / Patterson, J. (author) / Rapposelli, P. (author) / O Callaghan, J. M. (author) / Holmes, J. D. (author) / Morris, M. A. (author) / Uskokovic, D. P.
2007-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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