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Influence of Charging on SiO~2 Etching Profile Evolution Etched by Fluorocarbon Plasmas
Influence of Charging on SiO~2 Etching Profile Evolution Etched by Fluorocarbon Plasmas
Influence of Charging on SiO~2 Etching Profile Evolution Etched by Fluorocarbon Plasmas
Radjenovic, B. (author) / Radmilovic-Radjenovic, M. (author) / Petrovic, Z. L. (author) / Uskokovic, D. P. / Milonjic, S. K. / Rakovic, D. I.
2007-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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