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    ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

    New search for: Lazzeri, P.
    New search for: Hua, X.
    New search for: Oehrlein, G.
    New search for: Iacob, E.
    New search for: Barozzi, M.
    New search for: Bersani, M.
    New search for: Anderle, M.

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    ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

    New search for: Lazzeri, P.
    New search for: Hua, X.
    New search for: Oehrlein, G.
    New search for: Iacob, E.
    New search for: Barozzi, M.
    New search for: Bersani, M.
    New search for: Anderle, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

    New search for: Lazzeri, P.
    New search for: Hua, X.
    New search for: Oehrlein, G.
    New search for: Iacob, E.
    New search for: Barozzi, M.
    New search for: Bersani, M.
    New search for: Anderle, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas

    Contributors:

    Lazzeri, P. (author) / Hua, X. (author) / Oehrlein, G. (author) / Iacob, E. (author) / Barozzi, M. (author) / Bersani, M. (author) / Anderle, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 7186-7189

    Publication date:

    2006-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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