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Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer
Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer
Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer
Ren, J. (author) / Sun, B. (author) / Zhang, D. W. (author)
APPLIED SURFACE SCIENCE ; 253 ; 9148-9153
2007-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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