Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer

Ren, J. / Sun, B. / Zhang, D. W. | British Library Online Contents | 2007

Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate

Maeng, W. J. / Oh, I. K. / Kim, W. H. et al. | British Library Online Contents | 2014

Effects of precursors on nucleation in atomic layer deposition of HfO2

Aarik, J. / Aidla, A. / Kikas, A. et al. | British Library Online Contents | 2004

Atomic layer deposition HfO2 capping layer effect on porous low dielectric constant materials

Cheng, Y. L. / Kao, K. C. / Huang, C. J. et al. | British Library Online Contents | 2015