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    Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

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    Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

    New search for: Wang, Y.
    New search for: Li, Z.
    New search for: Xiong, X.
    New search for: Li, X.
    New search for: Chen, Z.
    New search for: Sun, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

    New search for: Wang, Y.
    New search for: Li, Z.
    New search for: Xiong, X.
    New search for: Li, X.
    New search for: Chen, Z.
    New search for: Sun, W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
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    Document information
    Title:

    Action mechanism of hydrogen gas on deposition of HfC coating using HfCl4-CH4-H2-Ar system

    Contributors:

    Wang, Y. (author) / Li, Z. (author) / Xiong, X. (author) / Li, X. (author) / Chen, Z. (author) / Sun, W. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 390 ; 903-908

    Publication date:

    2016-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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