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Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering
APPLIED SURFACE SCIENCE ; 253 ; 8538-8542
2007-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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