Preparation of five-layered Si/SixGe1-x nano-films by RF helicon magnetron sputtering: Fid-Bau Portal

Preparation of five-layered Si/SixGe1-x nano-films by RF helicon magnetron sputtering

Tanemura, S. / Miao, L. / Watanabe, T. / Imaoka, M. / Tanemura, M. / Mori, Y.

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Preparation of five-layered Si/SixGe1-x nano-films by RF helicon magnetron sputtering

Tanemura, S. / Miao, L. / Watanabe, T. / Imaoka, M. / Tanemura, M. / Mori, Y.

Preparation of five-layered Si/SixGe1-x nano-films by RF helicon magnetron sputtering

Tanemura, S. / Miao, L. / Watanabe, T. / Imaoka, M. / Tanemura, M. / Mori, Y.

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Document information

Title:

Preparation of five-layered Si/SixGe1-x nano-films by RF helicon magnetron sputtering

Contributors:

Tanemura, S. (author) / Miao, L. (author) / Watanabe, T. (author) / Imaoka, M. (author) / Tanemura, M. (author) / Mori, Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 308-311

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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