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    Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films

    New search for: Wade, C. R.
    New search for: Silvernail, C.
    New search for: Banerjee, C.
    New search for: Soulet, A.
    New search for: McAndrew, J.
    New search for: Belot, J. A.

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    Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films

    New search for: Wade, C. R.
    New search for: Silvernail, C.
    New search for: Banerjee, C.
    New search for: Soulet, A.
    New search for: McAndrew, J.
    New search for: Belot, J. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films

    New search for: Wade, C. R.
    New search for: Silvernail, C.
    New search for: Banerjee, C.
    New search for: Soulet, A.
    New search for: McAndrew, J.
    New search for: Belot, J. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Tris(dialkylamino)aluminums: Syntheses, characterization, volatility comparison and atomic layer deposition of alumina thin films

    Contributors:

    Wade, C. R. (author) / Silvernail, C. (author) / Banerjee, C. (author) / Soulet, A. (author) / McAndrew, J. (author) / Belot, J. A. (author)

    Published in:

    MATERIALS LETTERS ; 61 ; 5079-5082

    Publication date:

    2007-01-01

    Size:

    4 pages

    ISSN:

    0167-577X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.1105 / 530

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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