Effects of temperature and oxygen pressure on binary oxide growth using aperture-controlled combinatorial pulsed-laser deposition: Fid-Bau Portal

Effects of temperature and oxygen pressure on binary oxide growth using aperture-controlled combinatorial pulsed-laser deposition

Bassim, N. D. / Schenck, P. K. / Donev, E. U. / Heilweil, E. J. / Cockayne, E. / Green, M. L. / Feldman, L. C.

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Effects of temperature and oxygen pressure on binary oxide growth using aperture-controlled combinatorial pulsed-laser deposition

Bassim, N. D. / Schenck, P. K. / Donev, E. U. / Heilweil, E. J. / Cockayne, E. / Green, M. L. / Feldman, L. C.

Effects of temperature and oxygen pressure on binary oxide growth using aperture-controlled combinatorial pulsed-laser deposition

Bassim, N. D. / Schenck, P. K. / Donev, E. U. / Heilweil, E. J. / Cockayne, E. / Green, M. L. / Feldman, L. C.

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Document information

Title:

Effects of temperature and oxygen pressure on binary oxide growth using aperture-controlled combinatorial pulsed-laser deposition

Contributors:

Bassim, N. D. (author) / Schenck, P. K. (author) / Donev, E. U. (author) / Heilweil, E. J. (author) / Cockayne, E. (author) / Green, M. L. (author) / Feldman, L. C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 785-788

Publication date:

2007-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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