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    Spontaneous Chemical Vapor Growth of NiSi Nanowires and Their Metallic Properties

    New search for: Kim, C. J.
    New search for: Kang, K.
    New search for: Woo, Y. S.
    New search for: Ryu, K. G.
    New search for: Moon, H.
    New search for: Kim, J. M.
    New search for: Zang, D. S.
    New search for: Jo, M. H.

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    Spontaneous Chemical Vapor Growth of NiSi Nanowires and Their Metallic Properties

    New search for: Kim, C. J.
    New search for: Kang, K.
    New search for: Woo, Y. S.
    New search for: Ryu, K. G.
    New search for: Moon, H.
    New search for: Kim, J. M.
    New search for: Zang, D. S.
    New search for: Jo, M. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Spontaneous Chemical Vapor Growth of NiSi Nanowires and Their Metallic Properties

    New search for: Kim, C. J.
    New search for: Kang, K.
    New search for: Woo, Y. S.
    New search for: Ryu, K. G.
    New search for: Moon, H.
    New search for: Kim, J. M.
    New search for: Zang, D. S.
    New search for: Jo, M. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Spontaneous Chemical Vapor Growth of NiSi Nanowires and Their Metallic Properties

    Contributors:

    Kim, C. J. (author) / Kang, K. (author) / Woo, Y. S. (author) / Ryu, K. G. (author) / Moon, H. (author) / Kim, J. M. (author) / Zang, D. S. (author) / Jo, M. H. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 19 ; 3637-3642

    Publication date:

    2007-01-01

    Size:

    6 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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